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moleculeOkada, Michio*; Moritani, Kosuke; Yoshigoe, Akitaka; Teraoka, Yuden; Nakanishi, Hiroshi*; Di
o, W. A.*; Kasai, Hideaki*; Kasai, Toshio*
Chemical Physics, 301(2-3), p.315 - 320, 2004/06
Times Cited Count：14 Percentile：41.85(Chemistry, Physical)O molecules adsorb dissociatively on Cu{1 0 0} surfaces to form the oxygen-saturated surface with the coverage of 0.5 ML. It has been found that the oxidation has proceeded more than 0.5 ML by using 2.3-eV-O molecular beams. The kinetics of the adsorption reaction was the first order. This reveals that the collision-induced adsorption results in the adsorption of only one oxygen atom. On the other hand, the reaction kinetics showed the second order in the case of 0.6-eV-O incidence. This implies that tentative molecular adsorption takes place in such low collision energy case.
Hashinokuchi, Michihiro*; Okada, Michio*; Ito, Hironori*; Kasai, Toshio*; Moritani, Kosuke*; Teraoka, Yuden
no journal, ,
We present the steric effect recently observed in the dissociative adsorption of NO on Si(111)-7
7 surface by using an oriented-molecular-beam apparatus especially designed for X-ray photoelectron spectroscopy. The (1/2,1/2,1/2) state-selected NO molecular beam with the kinetic energy of 58 meV was incident to Si(111) surface and adsorbed species were analyzed by XPS. We find that the reaction is more favorable for the N-end than that for the O-end. The steric preference becomes very small at 600K. This result shows that transient trapping into a shallow precursor state plays the key role in the stereodynamics of this surface reaction.
